Space optics technology leaps to the next level with nanostructure measurement technology

- KRISS developed 3D optical tomography technology that reproduces multi-layer thinfilm structure -

The KRISS team lead by Dr. Young-Sik Ghim, researcher of Advanced Instrumentation Institute, developed 3D tomography technology to measure the structure of multi-layer thinfilm devices by space optical technology. The research Team realized a "direct nondestructive measurement" and achieved a perfect three-dimensional image of the inner structure that has been remained a challenge for metrology of multi-layer thinfilms.
The core of nanotechnology is to place as many devices as possible in a given two-dimensional area. With the development of a three-dimensional multilayer structure
in which thin-film layers are stacked in a limited space, nanotechnology has exceeded the limitations of high speed and high capacity.

The optical tomography technique used the fact that there is a difference in light interference for each layered materials. By combining spectroscopic analysis technology, polarization and reflectance measurement technology, multi-layer thinfilm structures can be realized.

One of the most important features of optical tomography is that it does not damage the sample and can provide simultaneous measurement of the layer thickness and surface profile simultaneously like a scanning electron microscope. In addition, 3D image can be implemented based on complete information, so that inner structure can be analyzed accurately. Through this research result, we can expect manufacturing innovation such as increase productivity, improve quality, and reduce costs, as production and inspection lines can be unified without additional processes.

* Three-dimensional measurement of multi-layer nanostructure by 3D optical tomography
- (Left) After measuring the thickness and surface shape of each layer simultaneously,
(Right) 3 layer nano thin film structure is realized with perfect three - dimensional image.