Industrial Metrology

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The Division of Industrial Metrology strives to develop measurement technologies required to continuously scale up Korea’s key industrial competitiveness and the ones for industries as new growth engines. A measurement standard system is set up to guarantee the measurement outcome of characteristics of domestic materials.

Director: Dr. Dong-Jin Yoon (djyoon@kriss.re.kr)

Center for

  • Nanocharacterization (Dr. Jeong-Won Kim, jeongwonk@kriss.re.kr)
  • Nano-Bio Measurement (Dr. Tae Geol Lee, tglee@kriss.re.kr)
  • Safety Measurement (Dr. Ki-Bok Kim, kimkibok@kriss.re.kr)
  • Convergence Property Measurement (Dr. Jaeyong Song, jysong@kriss.re.kr)
  • Materials and Energy Measurement (Dr. Un-Bong Baek, ubbaek@kriss.re.kr)

Current research areas include the following:

  • Metrology in nano- and other types of materials
  • Monitoring of vacuum-related processes for advanced industries
  • Safety monitoring of large constructions such as buildings, bridges, tunnels, and energy generating facilities
  • Public-security inspection technologies

R&D Highlights _ Industrial Metrology

Nano-probe Application

A semiconductor devices are getting smaller and chips more complicated, it has become necessary to develop analytical and measurement techniques. Our team has studied the advanced metrology techniques for next-generation devices.
One of the challenges to 3D-AFM metrology is the precise control of the tip-sample separation when using advanced nano-probes. We have been studying the fabrication and interaction of various carbon nanotube tips while collaborating with other laboratories.
Our AFM in SEM systems is an AFM developed to be used in SEM. We have two kinds of AFM in SEMs: normal top-down AFM (TDAFM) and cross-sectional AFM (xAFM). Both AFM & SEM observe a sample surface in TDAFM, but SEM observes its cross-section while AFM does the sample surface. The TDAFM not only has a sample-scanning mode but also a head-scanning mode. The TDAFM has a closed-loop scan mode to image a sample exactly.
The size of a SEM probe directly impacts the image resolution that is critical in advanced SEM metrology. We developed an algorithm that calculates the probe size based on SEM images of the gold/ carbon sample. At the same time, we are developing cutting-edge methods to absolutely calibrate the probe size with home-made nano-edge MgO particles.
We are developing an Optically induced Force Microscope (OiFM) system based on the scanning probe microscopy (SPM) platform which can measure near field distributions of nano-device samples with a spatial resolution of less than 100 nm. The system utilizes an optical-binding force exerted on the SPM tip by laser-induced dipoles of a sample. The OiFM will be used to characterize future plasmonic devices such as metallic nano-particles and lithographic nano-holes for biological and semiconductor applications.
Our AFM system was optimized to measure sub-nanometer roughness. The background noise is 0.04 nm and drift is < 1 nm/min. Our result of HFO2 shows RMS roughness of 0.074 nm at a field of view of 50 nm and is able to distinguish grains smaller than 10 nm. Our system is able to measure ultra-thin layers more precisely.